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ONLINEISSN:1348-0391
e-Journal of Surface Science and Nanotechnology
Vol. 4 (2006) pp.563-565
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Characteristics of Bismuth trioxide film prepared by rapid thermal oxidation
Raid A. Ismail1)
1) Applied Physics Center, Ministry of Science and Technology, Iraq
(Received 23-Feb-2006)
(Accepted 26-Jun-2006)
Abstract:
This work presents novel results of structural, optical, and electrical properties of Bi2O3 film deposited on glass substrates by rapid thermal oxidation with aid of halogen lamp at 500°C for 45 s in static air condition without post-deposition heat treatment. The structural investigation showed that the grown bismuth trioxide film is polycrystalline and multiphase (α-Bi2O3 and β-Bi2O3). Optical properties revealed that these films having direct optical band gap of 2.55 eV at 300 K with high transparency in the visible and NIR regions. Furthermore, these results are compared with other published results. [DOI: 10.1380/ejssnt.2006.563]
Keywords:  Bismuth trioxide; thin film; rapid thermal oxidation

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To cite this article:
Raid A. Ismail, e-J. Surf. Sci. Nanotech. Vol. 4, p.563 (2006) .

doi:10.1380/ejssnt.2006.563
JOI  JST.JSTAGE/ejssnt/2006.563
Copyright (c) 2006 The Surface Science Society of Japan



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