Provider: Japan Science and Technology Agency Database: J-STAGE Content:text/plain; charset="utf-8" TY - JOUR TI - Resist Removal by using Atomic Hydrogen TI - AU - Horibe,Hideo AU - Yamamoto,Masashi AU - Kusano,Eiji AU - Ichikawa,Tomokazu AU - Tagawa,Seiichi JO - Journal of Photopolymer Science and Technology VL - 21 IS - 2 SP - 293 EP - 298 PY - 2008 DO - 10.2494/photopolymer.21.293 ER -