電気学会論文誌C(電子・情報・システム部門誌)
Online ISSN : 1348-8155
Print ISSN : 0385-4221
ISSN-L : 0385-4221
<電子物性・デバイス>
GaN半導体型フォトカソードの量子効率の劣化現象と波長依存性
早瀬 和哉西谷 智博目黒 多加志
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キーワード: GaN, フォトカソード
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2012 年 132 巻 8 号 p. 1261-1264

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A p-GaN semiconductor is the more suitable photocathode material than a p-GaAs semiconductor, because a p-type semiconductor with wide band gap has large vacuum level shift caused by surface band bending. We measured quantum yield degradation and quantum yield spectrum of a p-GaN photocathode with an NEA surface. The p-GaN photocathode had the process of quantum yield degradation from the extraction of photocurrent and the residual gas, it is found to be important to suppress backs-pattering due to the increase of background pressure. From the dependence of quantum yield of the p-GaN photocathode on excitation wavelength, the quantum yield spectrum rapidly increased around the band gap of GaN as expected.

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© 2012 電気学会
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