日本金属学会誌
Online ISSN : 1880-6880
Print ISSN : 0021-4876
ISSN-L : 0021-4876
低真空下における電子ビーム溶解法によるシリコン中リンおよびアンチモンの除去
三宅 正男平松 智明前田 正史
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2006 年 70 巻 1 号 p. 43-46

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  The removal of phosphorus and antimony from molten silicon under low vacuum conditions has been investigated by using a glow discharge electron gun. The gun could generate electron beam and melt silicon at the low vacuum of 5-7 Pa. Phosphorus and antimony in silicon were evaporated and removed from silicon by the electron beam melting: the concentration of phosphorus decreased from about 200 ppm to about 1 ppm in one hour and that of antimony was reduced from about 300 ppm to below 0.1 ppm in 5 minutes. The removal rates obtained at the low vacuum were almost the same as those observed under high vacuum conditions.

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© 2006 (公社)日本金属学会
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