論文
Si(110)-16×2単一ドメイン表面の作製
2008 年 29 巻 7 号 p. 401-406
詳細
2008 年 29 巻 7 号 p. 401-406
Widely well-defined Si(110)-16×2 single-domain surface has been fabricated utilizing the electromigration of the surface atoms. Tuning the direction of the dc during resistive heating to that of the surface reconstruction row realizes an alignment of the rows in one direction producing a mm-wide single-domain of 16×2 structure. The fabricated single-domain shows number of useful characteristics such as a strong one-dimensionality and the surface homochirality, suggesting various applications.
