TiN/BN ceramics multilayer films were deposited on Si (100) substrates by ion beam sputtering (IBS) under various deposition conditions. The deposited multilayer films were characterized by scanning electron microscopy (SEM), X-ray diffraction (XRD), Knoop hardness, and Multi-Beam-Optical Sensor (MOS). Internal stress of the multilayer thin films were changed by the multilayer periods (λ). Maximum hardness and internal stress of the multilayer thin films were observed at λ= 1530 nm. The enhancement effect in hardness and internal stress may be presumed the strain generation due to lattice stress at the interface between alternate ceramic thin films.