Journal of High Temperature Society
Print ISSN : 0387-1096
Chemical Reaction Engineering of Plasma CVD
Tatsuru SHIRAFUJI
Author information
Keywords: Plasma, Chemical Vapor Deposition, Thin Film, Chemical Reaction Engineering
JOURNAL FREE ACCESS

2011 Volume 37 Issue 6 Pages 281-288

Details
Download PDF (1352K)
Download citation RIS

(compatible with EndNote, Reference Manager, ProCite, RefWorks)

BIB TEX

(compatible with BibDesk, LaTeX)

Text
How to download citation
Contact us
Article 1st page
Content from these authors
© 2011 by High Temperature Society of Japan
Previous article Next article
Favorites & Alerts

Recently viewed articles
Share this page
feedback
 Top