Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Characterization of SiO2 Surface Treated by HMDS Vapor and O2 Plasma with AFM Tip
Akira KawaiJunko Kawakami
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2003 Volume 16 Issue 5 Pages 665-668

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Abstract

In order to prepare hydrophobic and hydrophilic surfaces, silane coupling treatment with hexamethyldisilazane (HMDS) and exposing to oxygen plasma are carried out to silicon oxide substrates, respectively. Surface force measurement indicates that the attractive force F of the AFM tip is more sensitive to surface energy variation of the solid surface. The adhesion work W mainly depends on polar component of surface energy. Positive correlation between elastic energy Ee of the cantilever tip and adhesion work W can be confirmed. By using two kinds of tips which have different component values of surface energy, surface property in lithography process can be analyzed.

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© 2003 The Society of Photopolymer Science and Technology (SPST)
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