Lithography Based on Molecular Glasses

Kousuke Tsuchiya; Seung Wook Chang; Nelson M. Felix; Mitsuru Ueda; Christopher K. Ober

doi:10.2494/photopolymer.18.431

Kousuke Tsuchiya, Seung Wook Chang, Nelson M. Felix, Mitsuru Ueda, Christopher K. Ober

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Keywords: molecular glasses, E-beam lithography, hexa(hydroxyphenyl)benzene, line edge roughness

JOURNAL FREE ACCESS

2005 Volume 18 Issue 3 Pages 431-434

DOI https://doi.org/10.2494/photopolymer.18.431

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Abstract

Several novel classes of molecular glasses were synthesized as photoresist materials for next generation lithography. These compounds were protected by protecting groups for chemically amplified systems and proved to possess high glass transition temperature (T_g) as well as amorphous properties. A positive-tone photoresist system with hexa(t-butoxy- carbonyloxyphenyl)benzene was demonstrated using E-beam lithography and 200 nm pattern size was obtained.

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