Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Spreading of Liquid Drop on Resist Film Surface
Akira KawaiAkihiro Takano
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2008 Volume 21 Issue 6 Pages 759-760

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Abstract

Liquid drop spreading is effective phenomenon for understanding nature of wetting processes such as pattern development, etching, cleaning, immersion lithography and so on. Liquid spreading can be measured by contact angle measurement. Spreading coefficient c in Neumann model is estimated for each film surface. Results obtained in this experiment indicate that the liquid drops on resist surfaces are more likely to spread compared with those on the inorganic substrates.

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© 2008 The Society of Photopolymer Science and Technology (SPST)
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