2000 Volume 16 Issue 6 Pages 593-596
A computer program was developed for the identification and quantification of organic contaminants on silicon wafer surfaces and related materials based on GC/MS spectral data. Information, such as the retention time (RT), mass number and peak intensity, was stored on 359 chemical compounds in the database. Some empirical equations were presented for calculating the existence probabilities of certain organic compounds. This method was confirmed for the identification and quantification of ultratrace organic contaminants on silicon wafer surfaces and related materials.