Analytical Sciences
Online ISSN : 1348-2246
Print ISSN : 0910-6340
ISSN-L : 0910-6340
The Analysis of High purity Silicon wafers using Glow Discharge Mass Spectrometry
D M P MiltonJ ClarkD PotterR C Hutton
Author information
JOURNALS FREE ACCESS

1991 Volume 7 Issue Supple Pages 1243-1246

Details
Abstract

A new discharge cell has been developed that can accommodate flat samples such as Silicon wafers. Data will be presented to demonstrate the characterisation of this new cell. The effect of varying the plasma conditions will be discussed in terms of maximising the silicon ion yield and reducing molecular interferences, thus improving the sensitivity of the VG 9000 GDMS. As a results detection limits of the sub-ppb level are readily attainable for most elements, with an ultimate limit of detection being a few ppt

Information related to the author
© The Japan Society for Analytical Chemistry
Previous article Next article
feedback
Top