DETERMINATION OF TRACE IMPURITIES IN TANTALUM OXIDE FILMS BY INDUCTIVELY COUPLED PLASMA MASS SPECTROMETRY COMBINED WITH ION EXCHANGE

Abstract

The determination of trace metals has been carried out by inductively coupled plasma mass spectrometry. A tantalum sample was dissolved and the influence of the matrix was rejected by anion exchange. Detection limits were 0.006-0.02 wt.ppm. This method is being used for the analysis of tantalum oxide films.