Bulletin of the Chemical Society of Japan
Online ISSN : 1348-0634
Print ISSN : 0009-2673
ISSN-L : 0009-2673
 
Extension of Photopolymerization Region from the Nanoscale to the Macroscopic Scale Using a Chemically Amplified Photoresist
Ryoji TakahashiSatoshi KanekoShintaro FujiiManabu Kiguchi
Author information
JOURNAL RESTRICTED ACCESS

2015 Volume 88 Issue 2 Pages 277-282

Details
Abstract

We have investigated the photopolymerization of a photoresist on Au nanoparticles. Photopolymerization proceeded when samples were irradiated with light wavelengths longer than 480 nm. This was verified by IR spectroscopy and the presence of an interference pattern under visible light due to the formation of a polymerized film on the substrate. The progress of photopolymerization was not observed on flat Au or quartz plates without the Au nanoparticles. The photopolymerization region was extended from the nanoscale to macroscopic scale using a chemically amplified photoresist at elevated temperatures. The source intensity, wavelength, reaction temperature, and irradiation time-dependence measurements revealed that interactions between the resist and the Au nanoparticles modified the electronic structure of the resists, or electron transfer from through interband excitation of Au. These interactions subsequently lead to a red shift in the threshold wavelength of photopolymerization.

Content from these authors

This article cannot obtain the latest cited-by information.

© 2015 The Chemical Society of Japan
Previous article Next article
feedback
Top