Bulletin of the Chemical Society of Japan
Online ISSN : 1348-0634
Print ISSN : 0009-2673
ISSN-L : 0009-2673
Thickness Measurement of Surface Layer by the Angular Dependent X-Ray Photoelectron Spectroscopy
Masamichi YamadaHaruo Kuroda
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1980 Volume 53 Issue 8 Pages 2159-2162

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Abstract

A sample-holding device to study the photoelectron take-off angle dependence of XPS spectrum is described. The take-off angle dependence was studied on a silicon surface covered with an oxide layer and a contamination carbon layer, and the (thickness)/(electron attenuation length) ratio of each layer was determined from the analysis of the angular dependence of the Si2p, O1s, and C1s peak intensities.

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