Chemistry Letters
Online ISSN : 1348-0715
Print ISSN : 0366-7022
ISSN-L : 0366-7022
Chemical Vapor Deposition of Some Heterocyclic Compounds over Active Carbon Fiber to Control Its Porosity
Yuji KawabuchiChiaki SotowaMasahiro KishinoShizuo KawanoD. Duayne WhitehurstIsao Mochida
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1996 Volume 25 Issue 11 Pages 941-942

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Abstract

Chemical vapor deposition (CVD) of heterocyclic compounds was examined over commercial pitch-based active carbon fiber (ACF). The ACF treated with pyridine, pyrrole, and thiophene showed excellent preformance in the gas separation of CO2/CH4. Thermal stability of the aromatic compounds around 700 °C appears an important factor to restrict its decomposition on the pore wall where the compound is adsorbed and carbonized.

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© 1996 The Chemical Society of Japan
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