Chemistry Letters
Online ISSN : 1348-0715
Print ISSN : 0366-7022
ISSN-L : 0366-7022
Letter
Indium Implantation onto Zeolite by Pulse Arc Plasma Process for the Development of Novel Catalysts
Satoru YoshimuraYoshihiro NishimotoMasato KiuchiMakoto Yasuda
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2015 Volume 44 Issue 10 Pages 1292-1294

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Abstract

Chemical substances that contain both indium (In) and silicon (Si) in close proximity catalyze certain organic chemical reactions. The implantation of In onto zeolite containing Si atoms was carried out by a pulse arc plasma process for the possible development of novel catalysts. X-ray photoelectron spectroscopy of the In-implanted zeolite revealed that In was successfully implanted. In addition, the In-implanted zeolite was capable of catalyzing an organic chemical reaction (i.e., Friedel–Crafts alkylation).

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© 2015 The Chemical Society of Japan
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