1940 年 10 巻 4 号 p. 577-587
1. In the cell of Allium cepa exposed to ultraviolet rays appear such features as cytoplasmic particles and tonoplast plasmolysis both of which mean the disorganization of the cytoplasm, when it is plasmolyzed. All these features which are caused in various kinds of plasmolyticum, indicate the increase of the adhesion between the cytoplasm and the cell membrane.
2. Various features of plasmolysis in the exposed cell can be explained by an assumption of the competition between the cohesion of the cytoplasm and its increased adhesion to the cell membrane.
3. The ions or molecules which are believed to penetrate easily into the cytoplasm, facilitate the destructive process, for instance tonoplast plasmolysis, in the plasmolysis of the exposed cell, when their salts are used as plasmolytica.
4. Al-ion which acts further to raise the adhesion in the exposed cell, restrains the sudden separation of the cytoplasm from the cell membrane in the course of plasmolysis. This action serves more or less advantageously to protect the cytoplasm from the disorganization.
A part of the present study has been carried out at the Laboratory of Plant Physiology of Prof. T. Sakamura, Sapporo, to whom the writer wishes to acknowledge his sintere gratitude for granting him the facilities of the laboratory. The writer wishes to express his sintere thanks also to Dr. T. Hori, Professor of Physics, Sapporo, for his kind help in using the physical apparatus. The writer expresses his thanks equally to the Japan Society for the Advancement of Cytology, by the grant from which this work was supported.