e-Journal of Surface Science and Nanotechnology
Online ISSN : 1348-0391
ISSN-L : 1348-0391
Regular Papers
Potential of High-density Convergent Plasma Sputtering Device for Magnetic Film Deposition
Taisei MotomuraTatsuo Tabaru
著者情報
ジャーナル フリー

2019 年 17 巻 p. 27-31

詳細
抄録

A high-density convergent plasma sputtering device has been developed for magnetic film deposition. The external convergent magnetic field is produced by a solenoid coil and a permanent magnet positioned behind the ferromagnetic metal target. The ion density and the ion accelerating voltage are individually controlled since the ion production and sputtering areas are separated like an ion beam sputtering device. Iron (Fe) thin films are deposited on an unheated substrate using argon plasmas under the target to substrate distance of 54 mm. The films consist of the α-Fe phase with a body-centered cubic crystal structure. The deposition rate was about 25 nm min−1 at a sputtering gas pressure of 0.2 Pa.

Fullsize Image
著者関連情報

この記事はクリエイティブ・コモンズ [表示 4.0 国際]ライセンスの下に提供されています。
https://creativecommons.org/licenses/by/4.0/deed.ja
前の記事 次の記事
feedback
Top