e-Journal of Surface Science and Nanotechnology
Online ISSN : 1348-0391
ISSN-L : 1348-0391
Scientific Articles
Simulation of Secondary Ion Position on the Detector for Three-dimensional Shave-off Method
So-Hee KangShinnosuke KishiKohei MatsumuraBunbunoshin TomiyasuMasanori Owari
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JOURNAL OPEN ACCESS

2020 Volume 18 Pages 116-120

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Abstract

The concept of three-dimensional (3D) shave-off secondary ion mass spectrometry (SIMS) is that enables to obtain the depth information of the sample simultaneously with the mass information using the vertical axis of a two-dimensional position-sensitive detector in the mass analyzer. In this study, we simulated the trajectory of secondary ions sputtered from a virtual sample in the 3D shave-off SIMS system and investigated the magnification ratio of the ions. The simulation results showed that we could distinguish the depth position of the secondary ions sputtered from a sample by the detected position in our concept of 3D shave-off SIMS.

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