2001 Volume 69 Issue 5 Pages 314-318
Photoelectrochemical deposition of metallic oxide (PbO2, RuOx, NiOOH, and CoOOH) onto a Ti substrate was studied and the electrochemical behavior of the prepared Ti/TiO2/MOx electrodes was examined. The photoelectrochemical deposition of MOx occurred in the solutions containing Mn+ ions on the Ti substrate under anodic bias. Electron holes produced on the TiO2 film surface under illumination may contribute the MOx formation. The prepared Ti/TiO2/MOx electrodes showed a tunneling current under anodic bias.