Photocatalytic Properties of Titanium Oxide Films Prepared by Gas Flow Sputtering Method

Abstract

Gas flow sputtering is a novel method to perform sputtering at high pressure around 1 Torr. Titanium particles were sputtered, forcibly transferred by the gas flow, and heaped up on a substrate forming TiO₂ film with the help of oxygen reaction gas. The photocatalytic activity and the crystal orientation of sputtered TiO₂ changed with the flowing flux of oxygen gas and the temperature of substrate. The TiO₂ synthesized at 0.3 seem O₂ flow rate was polycrystallites of rutile and anatase phases with high photocatalytic activity.