High Temperature Sputtered TiO₂ Film as an Efficient Blocking Layer for the Dye-sensitized Solar Cells

抄録

We investigated the carrier leakage blocking effect of the magnetron sputtered TiO₂ film insertion between transparent anodic electrode and porous TiO₂ film in the dye-sensitized solar cell (DSC), as a consequence of preventing the ionic short-circuiting of the electrolyte to the anodic electrode through porous TiO₂ film. The optimization of the deposition condition of the high temperature TiO₂ sputtering for the carrier leakage blocking is reported.