ノート
Electrochemical Deposition of Ni/SiC under Centrifugal Fields
2008 年 76 巻 11 号 p. 824-826
詳細
2008 年 76 巻 11 号 p. 824-826
Electrochemical deposition of Ni/SiC was carried out under centrifugal fields (69 and 113 G) and Earth’s gravity (1 G). The volume fraction of SiC in a nickel matrix was found to be increased by the applied gravitational force. In addition, morphological structure of the film was also affected by the centrifugal field. A plausible mechanism for the electrochemical deposition of Ni/SiC under the centrifugal force has also been proposed.
