2011 年 79 巻 5 号 p. 357-360
Pure Pt, Pure Ru, and Pt-Ru alloy thin films of different compositions (Ru:Pt=0.5–2.0) were prepared by magnetron sputtering. These thin films were characterized by Cu stripping voltammetry at different deposition potentials. Furthermore, we developed a novel technique to determine the surface Ru/Pt ratio of Pt-Ru alloys using Cu stripping voltammetry. The Ru/Pt ratios calculated from Cu stripping data agreed well with those measured by EDX in the Ru/Pt range of 0.6 to 2.0.