IEEJ Transactions on Electronics, Information and Systems
<Optoelectronics & Quantum Electronics>
Structure Analysis of Self-Assembled ErSi2 Nanowires Formed on Si(110) Substrates
Yusuke KatayamaRyouki WatanabeTomohiro KobayashiTakashi MeguroXinwei Zhao
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Volume 127 (2007) Issue 9 Pages 1294-1297

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Abstract

The ErSi2 nanowires were formed on Si (110) substrates by a self-assembled growth process without a high vacuum system. All of the nanowires were highly parallel and along the Si [1-10] direction. It was shown by structural analysis that the nanowires consisted of two types, which showed a similar surface morphology. The first type is ErSi2 nanowires buried into the Si substrate by a depth of 30nm, and the other is ErSi2 thin layers covering on wire-like Si surface. The later is suggested to be the remained structure after evaporation of the first type wires during the high temperature annealing.

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© 2007 by the Institute of Electrical Engineers of Japan
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