電気学会論文誌C(電子・情報・システム部門誌)
Online ISSN : 1348-8155
Print ISSN : 0385-4221
ISSN-L : 0385-4221
<電子物性・デバイス>
感光性低分子スピンコート膜による燐光性高分子パターン形成
宮川 大地室山 雅和田中 邦明臼井 博明
著者情報
ジャーナル 認証あり

2015 年 135 巻 2 号 p. 150-155

詳細
抄録

Patterned polymer thin films were prepared by spin-coating a solution consisting of an acryl monomer of 2-(9H-carbazol-9-yl)ethylmethacrylate, a photoinitiator of 4-(dimethylamino)benzophenone, and a phosphorescent dopant of iridium(III) bis(2-phenylpyridinate(4-vinylphenylpyridine)). The film was exposed to UV light through a photomask and rinsed with an organic solvent to develop a patterned polymer thin film. A mixture of tetrahydrofuran and 1,4-dioxane was used as the spin-coating solvent, and ethanol was used as the developing solution. The effects of solvent, exposure time, UV intensity, and the phosphorescent dopant were examined to optimize the patterning condition. The patterned film was utilized as an emissive layer to construct an organic light-emitting diode.

著者関連情報
© 2015 電気学会
前の記事 次の記事
feedback
Top