We have developed RuO2 thin and thick films by photo-induced chemical solution process such as excimer laser-assisted metal organic deposition (ELAMOD) and photo reaction of hybrid solution (PRHS). In the case of using ELAMOD, resistivity of tie films was 5.8×10-4 Ωcm. Also, flexible RuO2 films on Polyimide was obtained by PRHS. In this paper, we describe the formation of RuO2 films and the preparation of flexible RuO2 films for SiC power devices.
J-STAGEがリニューアルされました! https://www.jstage.jst.go.jp/browse/-char/ja/
