真空アーク蒸着法を用いたダイヤモンドライクカーボン膜の生成とその表面形状

抄録

Diamond-like carbon (DLC) films are deposited in a dc vacuum arc plasma with a graphite cathode. The arc current, the flow rate of hydrogen gas and the pressure are 50A, 10ml/min and O.05Pa, respectively. The substrate materials are Si (111), soda-glass and Mo. Process parameters are deposition time (3-30min). The films are analyzed by the laser raman spectroscopy and surface appearance of the films are observed with an optical microscope.
The results are as follows: (1) The films deposited under these conditions have diamond-like carbon structure. (2) The films deposited for 3min on Si or Mo and for 5min on glass wrinkle on the substrates. (3) The films deposited for more than 10min on Si and for more than 15min on glass crack and flake off the substrates. (4) The films deposited for more than 10min on Mo plainly stick on the substrate without any wrinkles or flakes.
It is found that plain DLC films are able to be produced by the vacuum arc deposition method if the deposition time is appropriately selected, while never by the conventional plasma CVD method.