電気学会論文誌A(基礎・材料・共通部門誌)
Online ISSN : 1347-5533
Print ISSN : 0385-4205
AlN膜生成用真空アーク蒸着装置における放電変動の抑制
滝川 浩史高松 秀樹榊原 建樹鈴木 泰雄
著者情報
ジャーナル フリー

114 巻 (1994) 3 号 p. 217-222

詳細
PDFをダウンロード (870K) 発行機関連絡先
抄録

When a conventional vacuum arc deposition apparatus is operated for producing AlN film, which is insulating material, the arc voltage gradually fluctuates and sometimes the arc extinguishes. In this paper, a new device for suppressing the fluctuation is designed and equipped to the conventional apparatus. The device is named Anode-Screen (AS).
Current distribution on the anode surface is measured as a function of axial distance from the cathode, z. It varies with time in the conventional apparatus while it doesn't in the new apparatus equipped with AS. Spectral intensities radiated from A, Al+, N2, and N2+ existing in the arc plasma measured as a function of z. AlN films are produced at the various positions in the apparatus and the thickness is measured. The results show that neither spectral intensity of only Al+ nor film thickness is influenced by AS.
The mechanism of fluctuation of the arc ignited in the conventional apparatus and its suppression effect of AS are discussed in terms of AlN film depositing on the anode surface and electron current path flowing into it.

著者関連情報
© 電気学会
前の記事 次の記事

閲覧履歴
ジャーナルのニュースとお知らせ
  • 【電気学会会員の方】購読している論文誌を無料でご覧いただけます(会員ご本人のみの個人としての利用に限ります)。購読者番号欄にMyページへのログインIDを,パスワード欄に生年月日8ケタ(西暦,半角数字。例:19800303)を入力して下さい。
ダウンロード
  • 論文(PDF)の閲覧方法はこちら
    閲覧方法 (389.7K)
関連情報

J-STAGEがリニューアルされました!  https://www.jstage.jst.go.jp/browse/-char/ja/

feedback
Top