電気学会論文誌E(センサ・マイクロマシン部門誌)
Online ISSN : 1347-5525
Print ISSN : 1341-8939
ISSN-L : 1341-8939
論文
機能性メタルの熱アシスト型反応性イオンエッチングに対応した自己加熱式ステージの開発
村田 祐貴韓 剛大川 太基今井 純一寒川 雅之安部 隆
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2017 年 137 巻 9 号 p. 262-266

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This paper describes development of self-heated stage suitable for thermal reactive ion etching (TRIE) of the functional metals. Thermal reactive ion etching was evaluated using both experiments and simulations for etching functional metals. The self-heated stage was designed based on the simulation results. TRIE employs a self-heated stage which is thermally insulated aluminum plate as the etching stage of a regular RIE apparatus. The stage temperature increases rapidly within 10 min and etch rate is not depend on process time. TRIE technique was used to etch various kinds of functional metals: Ti, Mo, Ta, Nb, and Ti alloy (Ti-6Al-4V). It did improve the etching rate of these materials greatly.

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