A micro channel plate (MCP) fabricated using micro technologies has been developed. Photosensitive glass is used for the microchannel substrate, and lead-glass is used for the secondary electron multiplication films. A new developed etching device (jet etching system) for photosensitive glass can form microchannels with an aspect ratio of 20 in combination with a suitable UV exposure energy and crystallization temperature. The lead-glass films are prepared using the sol-gel method and deposited on the internal surfaces of the microchannels. Films with added MgO of 5% had a higher coefficient of secondary electron emissions. The fabricated single-type MCP has a gain of 79 at an applied voltage of 1500 V.
