窯業協會誌
Online ISSN : 1884-2127
Print ISSN : 0009-0255
含窒素有機ケイ素化合物を用いたCVD法による窒化ケイ素微粉末の合成
鈴木 喬川上 殷正小山 剛司伊崎 寛正中野 里愛子設楽 琢治八京 孝一平井 敏雄新原 晧一
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95 巻 (1987) 1097 号 p. 91-95

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Fine amorphous silicon nitride powders were prepared by vapor phase reaction between nitrogen-containing, chloride-free organosilicon compound and NH3 at the production rate of-200g/h. Crystallization was carried out by heat treating the resulting amorphous powders in Ar atmosphere at 1500°C. High purity crystalline silicon nitride powders could be synthesized with metallic impurities Fe, Al, Ca<50ppm, carbon content <1wt% and oxygen content of -1wt%. The specific surface area, mean particle size and a phase content were-10m2/g, 0.6μm and >95wt%, respectively. Mechanical properties of hot-pressed silicon nitride from the resulting crystalline powders were comparable to hot-pressed bodies fabricated from high purity silicon nitride powders by imide decomposition and carbothermic reduction of silica.

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