Journal of the Ceramic Society of Japan
Online ISSN : 1882-1022
Print ISSN : 0914-5400
Rayleigh Scattering and Fictive Temperature in VAD Silica Glass with Heat Treatment
Shin-ichi TODOROKIShigeki SAKAGUCHI
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1997 Volume 105 Issue 1221 Pages 377-380

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Abstract

This paper presents a reduction in the Rayleigh scattering intensity in VAD silica glass with annealing and its relation to the fictive temperature, TF, estimated from the shift in the infra-red (IR) absorption peak, an overtone mode of the Si-O-Si stretching vibration. An 18% decrease was observed in the scattering intensity for a sample annealed at 950°C for 156h. The decrease appears to be mainly due to the TF reduction. The TF reduction rate for a dehydrated sample was higher than that for an undehydrated sample. This is explained by the interaction between termination units (-OH and -Cl) and the glass network.

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