Oriented growth and electrical property of LiAl₅O₈ film by laser chemical vapor deposition

抄録

LiAl₅O₈ films were prepared by laser chemical vapor deposition, and the effect of the deposition temperature (T_dep) on the orientation, microstructure, and deposition rate was investigated. In the T_dep range of 980–1040 K, highly (110)-oriented LiAl₅O₈ film comprising flake-like grains elongated to [110] with flatter face of (111) formed at the maximum deposition rate of 70 µm h⁻¹. Above T_dep = 1050 K, dense LiAl₅O₈ films slightly oriented to (100) were deposited with faceted columnar grains of pyramidal and terrace shapes. The electrical properties of the LiAl₅O₈ films were examined using AC impedance spectroscopy. The complex plane plots of the dense LiAl₅O₈ film consisted of a semicircle associated with the bulk response and an inclined spike, suggesting the ionic conduction in the LiAl₅O₈ film.