Nihon Kessho Gakkaishi
Online ISSN : 1884-5576
Print ISSN : 0369-4585
Review Articles
Detailed Structure Analyses of Inhomogeneous Amorphous Silicon Monoxide
Akihiko HIRATAShinji KOHARAHideto IMAIMingwei CHEN
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Volume 59 (2017) Issue 4 Pages 159-165

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Abstract

We present an approach for constructing a realistic structure model of inhomogeneous amorphous materials by combining angstrom-beam electron diffraction, synchrotron X-ray scattering, and simulation techniques. Local structure information obtainable by angstrom-beam electron diffraction is effective to choose a probable model from some possible models that satisfy a structure factor of X-ray scattering. We applied this approach to amorphous SiO and successfully constructed a realistic model including nanoscale Si and SiO2-like regions together with abundant interfacial Si suboxides.

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© 2017 The Crystallographic Society of Japan
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