J-STAGE トップ  >  資料トップ  > 書誌事項

日本結晶学会誌
Vol. 59 (2017) No. 4 p. 159-165

記事言語:

http://doi.org/10.5940/jcrsj.59.159

総合報告

We present an approach for constructing a realistic structure model of inhomogeneous amorphous materials by combining angstrom-beam electron diffraction, synchrotron X-ray scattering, and simulation techniques. Local structure information obtainable by angstrom-beam electron diffraction is effective to choose a probable model from some possible models that satisfy a structure factor of X-ray scattering. We applied this approach to amorphous SiO and successfully constructed a realistic model including nanoscale Si and SiO2-like regions together with abundant interfacial Si suboxides.

Copyright © 2017 日本結晶学会

記事ツール

この記事を共有