日本結晶学会誌
Online ISSN : 1884-5576
Print ISSN : 0369-4585
ISSN-L : 0369-4585
挿入光源 (BL10XU) と第3世代XAFS
―高輝度光源のもたらす新世界―
大柳 宏之石井 真史李 哲虎サイニ ノーラン桑原 裕司斉藤 彰橋本 秀樹泉 康雄
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2000 年 42 巻 1 号 p. 41-50

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We report on the initial test of undulator tuning for the beamline BL10XU at Spring-8. The optics of BL10XU is quite simple, i.e., major optical components are a rotated-inclined double crystal monochromator designed by Ishikawa and a double flat mirror. One of a standard in-vacuum type undulator (U032V) is used. Since a typical energy range of - 1 keV is required as a routine EXAFS scan, both monochromator and undulator gap should be controlled during a scan; an undulator gap is varied so that a monochromator acceptance can track the undulator peak. On varying an undulator gap from 9.6 mm to 22 mm, a wide energy range (5-30 keV) is covered. We demonstrate that undulator tuning can provide glitch-free transmission spectra with a high energy resolution (1.5 eV at 9 keV) .

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