エレクトロニクス実装学会誌
Online ISSN : 1884-121X
Print ISSN : 1343-9677
銅微細パターン作製のための172nm真空紫外光を用いた液晶ポリマーフィルムの表面改質
福谷 修平浅倉 秀一不破 章雄
著者情報
ジャーナル フリー

2005 年 8 巻 4 号 p. 325-329

詳細
抄録

This work reports on the surface modification of liquid crystalline polymer (LCP) films using 172 nm vacuum ultraviolet (VUV) light for fabricating copper (Cu) finepattern on the surface. First, the LCP film was VUV-irradiated for 30-90 min under a pressure of 1.0×103 Pa. Surface wettability, topography and composition were investigated by water contact angle, atomic force microscopy and X-ray photoelectron spectroscopy (XPS), respectively. It was revealed that the LCP surface became hydrophilic without roughening the surface. From XPS measurements, the surface was confirmed to be covered with oxygen-containing groups. Secondly, an amino-terminated organosilane film was prepared on this film by chemical vapor deposition. Then, palladium (Pd) particles as a catalyst for electroless Cu plating were immobilized on a VUV-lithographically micropatterned amino-terminated film with coordinate bonds between amino-group and Pd (II) ions. Finally, as Pd (II) ions were reduced to Pd (0) by formaldehyde solution, Cu finepattern with 15μm wide were electroless plated on the surface.

著者関連情報
© 一般社団法人エレクトロニクス実装学会
前の記事 次の記事
feedback
Top