抄録
It is very useful to be able to practically monitor the plasma on the synthesis of titanium nitrides by an activated reactive evaporation (ARE) method using optical emission spectroscopy. Since each of emission lines from titanium and nitrogen could be detected without interference, the relationship between the intensities of the emission lines and the important operating parameters of ARE such as applied probe voltage, EB emission current and nitrogen partial pressure were investigated in the present paper. The results were summarized as follows.
(1) Both of the titanium and nitrogen emission intensities were proportional to the applied probe voltage.
(2) The titanium emission intensity increased with increasing EB emission current with or without nitrogen.
(3) The nitrogen emission intensity increased with increasing partial pressure, but the titanium emission intensity decreased.
(4) It was found that the N/Ti atomic ratios of titanium nitride films analysed by EPMA were slightly correlated to the N/Ti emission intensity ratios of the plasma monitored.
