容器成長法の基本技術 : 材料融液と容器との適合性(<特集>バルク結晶の成長(I))

抄録

The Vertical Bridgman method (VB) and the Vertical Gradient Freeze method (VGF) are superior to the Gzochralski method (CZ) from the standpoint of thermal environment due to the former being low temperature gradient. In spite of this technological merit, applications of VB and VGF have been few. The reason why VB and VGF have not been popular is that these growing techniques had to wait for suitable advances in chemical, the crucible, atomosphere and raw material used. In this paper, first we consider the technological merits and problems facing the VB and VGF methods at this time. Next we present a powerful solution to these problems, namely Reactive gas Atomosphere Processing method (RAP) which is applied to the purification process of metallic halide materials. The application of RAP to halide materials results the non-sticking condition between the crystal and the crucible. This idea of RAP is also applicable to metals, semiconductors and oxides. This new development will substantially improve VB and VGF methods.