2006 年 33 巻 4 号 p. 254-255
Colloid crystallization by a method similar to the graphoepitaxy is described. In this method, V-shaped pits and grooves with specific angles are used for the crystallization of colloid particles; such the pits and grooves can be fabricated by anisotropic etching of silicon substrates. This method has the advantages of ease of fabrication, and diameter-free. The experimental results on this method are presented.