Epitaxial Growth and Characterization of 4H-SiC Layers(<Special Issue>)Opening Up a New World of Crystal Growth on SiC)

抄録

The growth of thick 4H-SiC epilayers needed for high power applications is described using horizontal hot-wall chemical vapor deposition with both the standard and the chloride based chemistry. The use of various kinds of substrates (various off-axis and nominally on-axis substrates) is compared and advantages and drawbacks are discussed for each case. Low angle off-cut substrates are proposed for further development of the SiC activities. Using the chloride based approach the Cl/Si ratio is a new important parameter and chlorinated precursor as methyl-trichlorosilane is shown more efficient than the simple addition of chlorine to the gas mixture.