薄膜のエピタクシャル成長 : 電顕による"その場"観察

抄録

The currently accepted concepts of growth mechanisms of epitaxial thin films were critisized on the basis of in-situ UHV electron microscopy for various systems of film and substrate materials. All the previously reported evidences for the recent belief that post-nucleation realignment of growing particles by translation and rotation is more important than the alignment at nucleation stages in the nucleation and growth or Volmer-Weber mode were shown to be invalid. Various unknown aspects of the monolayer-by-monolayer overgrowth or Frank-van der Merwe mode were shown. As to the Stranski-Krastanov growth mode, the evidences for which had been given by LEED-AES., need of more detailed examinations utilizing the capability of electron microscopy for surface analysis was mentioned, showing some evidences for the capability.