Micro-fabrication technologies have recently developed dramatically and fabrication methods have become much-needed with which devices on the order of micrometer can be fabricated precisely. In particular, methods of fabricating MEMS and microscopic optical devices as typified by a photonic crystal are in huge demand. In this study, we propose a novel stereolithography method using evanescent light instead of propagating light to realize a 100-nanometer resolution. With this method, we intend to establish the nano-stereolithography with higher accuracy and flexibility. In the second report, we performed the fabrication of in-plane lattice structures, which is strongly required as diffraction grating, diffractive optics, photonic crystals, etc. Theoretical and experimental analyses suggest that the proposed stereolithography method using evanescent light has a potential to fabricate micro three-dimensional objects with a resolution of sub-micrometer.