フェライト材のメカノケミカルポリシング(第1報)

加工液,定盤材質及び加工機構について

抄録

This paper presents some experimental results on mechano-chemical polishing of ferrite, and suggestion on the mechanism of mechano-chemical polishing. Such elastic polishing plates as synthetic leather is popularly used with an alkaline polishing fluid in the mechano-chemical polishing of semiconductive materials. In this paper, however, polishing plates made by either tin or lead are used with chemically active polishing fluid to ferrite. Electro-chemical action is added to mechanical polishing for the sake of composing the local cell between a polishing plate and a workpiece. Electro-chemical action not only increases stock removal rate twice or more, but also reduces the surface damaged layer of workpieces a quarter or less in comparison with those in mechanical polishing process.