抄録
This paper presents a method of optimum design of multilayer-antireflection films based on database of material properties. In the design process of the optical multilayer films, the designer must determine appropriate refractive index and thickness of each thin film in accordance with design specifications on reflectance distribution. There lies the difficulty of the design where it is not clear such as the formulation of the multilayer structure to minimize the reflectance at the prescribed wavelength range. Furthermore, even if the refractive index is determined it does not always follow that the material which has the specified refractive index is available. To overcome these difficulties, the genetic algorithm and the database are used for the optimization process. The way to apply the genetic algorithm to design the structure of the multilayer films and its optimization are described in detail. Some results of typical problems are shown to demonstrate and discuss the effectiveness of the proposed method.
