35 巻 (1988) 3 号 p. 202-204
Thin films of spinel-type iron oxides with (100) orientation were prepared from Ferrocene as a starting material by Plasma assisted CVD. The X-ray diffraction patterns of the films showed that the (100) orientation was dependent on both the flow rate ratio of Ferrocene to Oxygen and the total gas pressure, but independent on Plasma RF power and substrates (Si(111), Si(100), Glass, saphire(012), saphire(001) and Polyimide film).