EPマグネトロンスパッタ法によるCo-Cr膜の作成と特性

抄録

This paper is concerned with the experimental results of the high rate and low temperature deposition of Co-Cr films using an exposed pole (EP) magnetron co-sputtering system developed by the authors for deposition of ferromagnetic binary alloy films. In this paper we prepare a composite target constructed of a Co washer, a Cr cylinder and a Co disk, and examine the performance of the sputtering system and evaluate the film quality.
Results :
1) Maximum deposition rate was as high as 0.18 μm/min for 7.6 W/cm² input power.
2) The deposition rate was higher for lower sputtered gas pressure.
3) The substrate temperature was as low as 100°C for 7.6 W/cm² input power.
4) The C-axis of the deposited Co-Cr films were in the perpendicular direction to the film plane and Δθ₅₀=8-13°.
5) Perpendicular magnetic anisotropy films were obtained for the films of M_s=300-800 emu/cc and H_c=250-350 Oe.
Thus, it is concluded that EP magnetron co-sputtering is very effective for the deposition of Co-Cr films.