Gd-Co合金のスパッタプラズマ発光分析

抄録

A study on rf sputtering plasma of Co, Gd pure metals and Gd₂₆Co₇₄ alloy with optical emission spectroscopy (OES) is performed under various discharge conditions such as argon pressure P_Ar, taget voltage V_rf and substrate bias voltage V_b. From the measurements of OES line intensities and deposition rates in various P_Ar, V_rf and focussing field H, it is found that the line intensity of both Co and Gd atoms is represented as a linear or square function of the atomic densities in the plasma. Moreover, the preferential resputtering effect of Gd atoms is also confirmed from the change of the line intensity under the condition of negative bias voltage | V_b | ≥20V.